“Analysis of trap effect on reliability using the charge pumping technology in La-incorporated high-k dielectrics”,Microelectronics Eng., 88, 3415-3418, Dec. 2011

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“Phase separation of Ni germanide formed on a Ge-on-Si structure for Ge MOSFETs,” Electrochemical and Solid-State Lett. 11(1), H1, 2008.

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