“Higher Permittivity rare earth doped HfO2 and ZrO2 dielectrics for logic and memory applications”, Proc. of VLSI-TSA, 2007. (Invited)

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“Stabilization of Higher-k Tetragonal HfO2 by SiO2 Admixture Enabling Thermally Stable Metal Insulator Metal Capacitors”, Appl. Phys. Lett., 91, 072902, 2007.

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