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exel2014-09-02 16:20:232014-09-02 16:20:34“Band-Engineered Low PMOS VT with High-K/Metal Gates Featured in a Dual Channel CMOS Integration Scheme,” Proc. of Symp. on VLSI Tech., p.154, 2007
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exel2014-09-02 14:24:282014-09-02 14:24:32 “Comparative Study of Trapping Characteristics of HfSiON Dielectric in nMOSFETs with Poly-Si or TiN as Gate Electrode,” Electronic Materials Conference, 2004
