“Nickel-silicide phase effects on flatband voltage shift and equivalent oxide thickness decrease of hafnium silicon oxynitride metal-silicon-oxide capacitors,” Appl. Phys. Lett. 86, p.222966, 2005

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“Charge trapping and detrapping characteristics in hafnium silicate gate stack under static and dynamic stress,” IEEE Elect. Dev. Lett., 26, p.197, 2005

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