글
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 17:27:522014-09-02 17:27:55“Characterization of ultra-thin dielectric using time domain reflectometry" presented at Int. Workshop on Dielectric Thin Films. (IWDTF) , 2013.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 16:44:052014-09-02 16:44:15 "The Effects Of Ge Composition And Si Cap Thickness On Hot Carrier Reliability Of Si/Si1-XGex/Si P-MOSFETS With High-K/Metal Gate", Proc. Of Symp. On VLSI Technology, p.56, 2008
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 16:43:342014-09-02 16:43:37“Mechanisms Limiting EOT Scaling and Gate Leakage Currents of High-k/Metal Gate Stacks Directly on SiGe and a Method to Enable Sub-1nm EOT", Proc. Of Symp. On VLSI Technology, p.92, 2008.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-01 13:58:282014-09-01 13:58:38" Leakage current limit of time domain reflectometry in ultra-thin dielectric characterization," Jpn. J. of Appl. Phys. 53, 08LC02, (2014). (Special Issue)
