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“The frequency dependence of AC stress induced charging and it’s relaxation in TiN/Hf-Silicate NMOSFETs ,” Proc. of SISC, 2004.

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“Thermal response of Ru electrodes in contact with SiO2 and Hf based high-K gate dielectrics,” J. Appl. Phys. 98, p.043520, 2005

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