“Determination of Strain in the Silicon Channel Induced by a Metal Electrode”, Microscopy and Microanalysis 2007 Meeting, Fort Lauderdale, Florida, Aug 5-9 (2007).

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“Capacitance analysis of highly leaky Al2O3 MIM capacitor using time domain reflectometry,” IEEE Electron Dev. Lett., 33(9), p. 1303-1305, Jul. 2012.

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“Effects of film stress modulation using TiN metal gate on stress engineering and its impact on device characteristics in metal gate/ high-k dielectric SOI FinFETs,” IEEE Electron. Dev. Lett., 29, p.487, May. 2008.

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“Determination of Strain in the Silicon Channel Induced by a Metal Electrode” Microscopy and Microanalysis, 13, Supplement S02, pp 838-839, 2007.

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“Effects of Metal Gate-Induced Strain on the Performance of Metal-Oxide-Semiconductor Field Effect Transistors with Titanium Nitride Gate Electrode and Hafnium Oxide Dielectric”, Appl. Phys. Lett., 91, p.033511, 2007.

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