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exel
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exel2014-09-02 15:39:542014-09-02 15:39:58 “Detection of Trap Generation in High-k Gate Stacks by Constant Voltage Stress due to constant voltage stress”, Proc. of VLSI-TSA, 2006.
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exel
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exel2014-09-02 15:39:232014-09-02 15:39:34“Relationship of HfO2 Materials Properties and Transistor Performance”, VLSI-TSA, 2006.
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exel
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exel2014-09-02 15:37:062014-09-02 15:37:13 “Detection of Electron Trap Generation Due to Constant Voltage Stress on High-κ Gate Stacks”, Proc. of IRPS, p.169 , 2006.
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exel
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exel2014-09-02 15:30:422014-09-02 15:30:45“Surface Preparation Techniques Used for Fabricating High-κ/Metal Gate Device Structures”, ISTC, 2006. (Invited)
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exel
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exel2014-09-02 15:26:332014-09-02 15:26:36“Enhanced Reliability In Ultra-Scaled HfSiON Gate Dielectrics Through Suppressed Crystallization,” SISC, 2005.
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exel2014-09-02 15:21:432014-09-02 15:21:46“Detection of Trap Generation in High-k Gate Stacks due to Constant Voltage Stress,” Proc. of Int. Integrated Rel. Workshop, p.78, 2005.
