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exel2014-09-01 11:01:552014-09-01 11:01:58“Comparison of multilayer dielectric thin films for future metal-insulator-metal capacitors: Al2O3/HfO2/Al2O3 versus SiO2/HfO2/SiO2,” Jpn. J. of Appl. Phys. 50(10), Part 2 (2011).
