“N-type band edge work function demonstration using PEALD-HfSiN gate electrodes on high-k dielectrics”, Proc. of ALD conference, 2006.

“Fermi-level Pinning and Threshold Voltage Roll-Off Phenomena at Low Effective Oxide Thicknesses for p-MOS Work Function Metal Gates”, ISAGST, 2006.

“The Effective Work Function of Plasma Injection-Atomic Layer Deposition (PI-ALD) Metal Nitride Electrodes on High-k Dielectric Materials,” AVS ALD symposium, 2005.