“A Comprehensive and Comparative Study of Interface and Bulk Characteristics of nMOSETs with La-Incorporated High-k Dielectrics”, Proc. of Int. Electron Device Meeting, p.111, 2008.


“A comparative study of reliability and performance of strain engineering using CESL stressor and mechanical strain,” Proc. of IRPS, 2008.

“PBTI Associated Hot Carrier Characteristics of Nano-scale NMOSFETs with Advanced Gate Stack of Metal Gate/High-k dielectrics,” discussed at SISC, 2007.

“A Correlation Between Oxygen Vacancies and Dielectric Breakdown in a Single Zirconium Oxide Metal-Insulator-Metal Capacitor,” In press, IEEE Trans. Elect. Dev. (2014).

“Correlation of Low Frequency Noise Characteristics of Graphene Devices with an Interfacial Charge Exchange Reaction, ” Carbon, 50(11), p.2046, Sep. 2012.