“A Comprehensive and Comparative Study of Interface and Bulk Characteristics of nMOSETs with La-Incorporated High-k Dielectrics”, Proc. of Int. Electron Device Meeting, p.111, 2008.

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“A comparative study of reliability and performance of strain engineering using CESL stressor and mechanical strain,” Proc. of IRPS, 2008.

“PBTI Associated Hot Carrier Characteristics of Nano-scale NMOSFETs with Advanced Gate Stack of Metal Gate/High-k dielectrics,” discussed at SISC, 2007.

“A Correlation Between Oxygen Vacancies and Dielectric Breakdown in a Single Zirconium Oxide Metal-Insulator-Metal Capacitor,” In press, IEEE Trans. Elect. Dev. (2014).

“Correlation of Low Frequency Noise Characteristics of Graphene Devices with an Interfacial Charge Exchange Reaction, ” Carbon, 50(11), p.2046, Sep. 2012.

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