글
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 16:12:452014-09-02 16:13:04 “Test Structures for Accurate RF C-V measurement for Nano-Scale CMOSFETs with HfO2 and TiN Tetal Gate”, ICMTS, 2007.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 15:40:172014-09-02 15:40:20“Assessment of Process-Induced Damage in High-κ Transistors”, Proc. of ICICDT, p.1, 2006.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 15:39:542014-09-02 15:39:58 “Detection of Trap Generation in High-k Gate Stacks by Constant Voltage Stress due to constant voltage stress”, Proc. of VLSI-TSA, 2006.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 15:37:062014-09-02 15:37:13 “Detection of Electron Trap Generation Due to Constant Voltage Stress on High-κ Gate Stacks”, Proc. of IRPS, p.169 , 2006.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 15:21:432014-09-02 15:21:46“Detection of Trap Generation in High-k Gate Stacks due to Constant Voltage Stress,” Proc. of Int. Integrated Rel. Workshop, p.78, 2005.
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 15:13:302014-09-02 15:13:36“Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications,” Proc. of VLSI, p.46, 2005.