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“Detection of Trap Generation in High-k Gate Stacks by Constant Voltage Stress due to constant voltage stress”, Proc. of VLSI-TSA, 2006.

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“Detection of Electron Trap Generation Due to Constant Voltage Stress on High-κ Gate Stacks”, Proc. of IRPS, p.169 , 2006.

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“Detection of Trap Generation in High-k Gate Stacks due to Constant Voltage Stress,” Proc. of Int. Integrated Rel. Workshop, p.78, 2005.

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“Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications,” Proc. of VLSI, p.46, 2005.

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