“Detection of Electron Trap Generation Due to Constant Voltage Stress on High-κ Gate Stacks”, Proc. of IRPS, p.169 , 2006.

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“Detection of Trap Generation in High-k Gate Stacks due to Constant Voltage Stress,” Proc. of Int. Integrated Rel. Workshop, p.78, 2005.

“Combinatorial Study of Ni-Ti-Pt Ternary Metal Gate Electrodes on HfO2 for the Advanced Gate Stack”, Appl. Phys. Lett., 89, p.142108, 2006.

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