“Issues associated with p-type band-edge effective work function metal electrodes: Fermi-level pinning and flatband roll-off,” Proc. of VLSI-TSA, 2007

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“Decoupling the Fermi level pinning effect and intrinsic limitations on p-type effective work function metal electrodes”, Microelectronic Engineering, 85, p.2, Jan. 2008.

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“On oxygen deficiency and fast transient charge trapping effects in high-Kdielectrics”, IEEE Elec. Dev. Lett., 27, p.984, 2006.

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“Comparison of effective workfunction extraction methods using capacitance and current measurement techniques”, IEEE Elec. Dev. Lett.,27,7,p.598, 2006.

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“Thickness optimization of the TiN metal gate with polysilicon-capping layer on Hf-based high-k dielectric”, Microelectronic Engineering, 83, 460, 2006.

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