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exel2014-09-02 14:53:172014-09-02 14:53:24 “Effect of high pressure deuterium annealing on electrical and reliability characteristics of MOSFETs with high-k gate dielectric,” Proc. of IRPS, p.646, 2005.
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exel2014-08-29 14:28:182014-08-29 14:28:24“Improved Interface Quality and Charge-Trapping Characteristics of MOSFETs With High-k Gate Dielectric,” IEEE Elec. Dev. Lett., 26. p.725, 2005
