“Spectroscopic analysis of the process dependent microstructure of ultra-thin high-k gate dielectric film systems”, 5th International Symposium on Atomic Layer Characterization for New Materials and Devices, 2005.

“Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface,” MRS spring meeting, San Francisco, 2004

“The effect of interfacial layer properties on the performance of Hf-based gate stack devices”, J. Appl. Phys. 100, p.094108, 2006.

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