글
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 11:13:462014-09-02 11:13:50“High Performance CMOS Devices on SOI for 90 nm Technology Enhanced by RSD (Raised Source/Drain) and Thermal Cycle/Spacer Engineering,” Tech. Dig. of Int. Electron Device Meetings, 2003
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
0
0
exel
https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif
exel2014-09-02 10:51:482014-09-02 10:51:51 “Gate Postdoping to Decouple Implant/Anneal for Gate, Source/Drain, and Extension:Maximizing Polysilicon Gate Activation for 0.1 µm CMOS Technologies,” Tech. Dig. of VLSI Symposium, 2002
