“Enhanced Surface Preparation Techniques for the Si/High-k Interface,” Ultra Clean Processing of Silicon Surfaces Conference VII , Solid State Phenomena, Vols 103-104, p.11-14, Fall 2004

“Integration Issues of High-K Gate Stack: Process-Induced Charging,” International Reliability Physics Symposium, p.479, 2004. (Invited)

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“Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface,” MRS spring meeting, San Francisco, 2004

“ Physical comparison of HfO2 transistors with polycrystalline silicon and TiN electrodes”, Appl. Phys. Lett., 87, p.082903, 2005

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