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exel2014-09-02 16:46:422014-09-02 16:46:45“Breakdown in the metal/high-k gate stack: Identifying the “weak link" in the multilayer dielectric,” Proc. of Int. Electron Device Meeting, p.791, 2008.
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exel2014-09-01 11:20:212014-09-01 11:20:24 "A study of the leakage current in TiN/HfO2/TiN capacitors ," Microelectronic Engineering, v.95, p.71-73, Jul. 2012.
