“A study on Hysteresis Effect of Barrium Strontium Titanate Thin Films for Alternative Gate Dielectric Application,” Proceedings of MRS Fall Meeting , 1999

“Effect of Barrier layer on the Electrical and Reliability Characteristics of High-k gate dielectric films,” Tech. Dig. of Int. Electron Device Meetings, p.707, 1998

“Comparative study of TiO2 and Ta2O5 on JVD nitride as an alternative gate dielectrics,” Proceedings of 29th IEEE SISC, p.67, 1998.

“Sputtered BST Thin Films for Alternative High K Gate Dielectrics,” Proceedings of American Vacuum Society Symposium, Austin, 1998