J.Y. Park, T.J. Yoo, J.M. Yu, B.H. Lee, Y.G. Choi, "Impact of Post-Metal Annealing with Deuterium or Nitrogen for Curing a Gate Dielectric using Joule Heat Driven by Punch-Through Current", IEEE Electron Device Letters (2020). DOI 10.1109/LED.2020.3043384
