Device physics for nanoscale solid state devices (2011, Spring)
Goal
This class will review the basic device physics and cover advanced device physics of nanoscale solid state devices. This course is a prerequisite course for the Advanced Electrical Characterization Methods for nano scale devices.
Develop basic/advanced physical concepts for the submicron device operations.
Understand scopes and limits of device physics
Review state of art integration technologies
Prepare students for electrical characterization lab course
Text book
Y. Taur, T.H.Ning, “Fundamentals of Modern VLSI devices”, 2nd ed.,
References
M. Shur, Physics of Semiconductor devices,
B. Streetman, Solid State Electronic Devices, Chapter 11, 12, Prentice Hall
Prerequisite
Semiconductor physics (undergraduate level) : preferred, but not mandatory
Exams
TBD
Syllabus
(Spring, 2011)
Class | Topic | note | Homework | Date |
---|---|---|---|---|
1st week | Introduction 별첨 참조 | Note1 | 3/3 | |
2nd week | History of semiconductor | Note2 | HW1 | 3/8, 3/10, 3/15 |
3rd week | Basic Device physics—pn junction (Taur, Ch.2) | Note3 | 3/17 | |
4th week | Basic Device physics—pn junction (Taur, Ch.2) | HW2 | 3/22, 3/25 | |
5th week | Basic Device physics—contact (Taur, Ch.2), Exam 1 (3/31, in class) | Note4 | 3/29, 3/31 | |
6th week | MOSFET devices (Taur, Ch.3) | Note5 | HW3 | 4/5, 4/7 |
7th week | MOSFET devices (Taur, Ch.3) | HW4 | 4/12, 4/14 | |
8th week | CMOS device design (Taur, Ch.4) | Note6 | 4/19, 4/21 | |
9th week | Mid term exam | 4/26 (No class), 4/28 | ||
10th week | CMOS performance factors (Taur, Ch.5) | Note7 | HW5 | 5/3, 5/5 |
11th week | SOI device (Taur, Ch.10) Short channel MOSFET-Strain Engineering | Note8 | HW6 | 5/10, 5/12 |
12th week | Exam 2 | Note9 | 5/17, 5/19 | |
13th week | Integration of short channel devices, Photonic Devices (Shur, Ch.5) | Note10 | HW7 | 5/24, 5/26 |
14th week | Physics of carbon electronics | Note11 | 6/7, 6/9 | |
15th week | Final exam | 6/14, 6/16 | ||
16th week | No class | 6/21 |
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