https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-03 14:32:232014-09-03 14:32:30“CMOS device on ultrathin SOI with a deposited raised source/drain, and a method of manufacture ,” US patent No.6891228 and No. 6828630, 2005.