“Single-layer thin HfO2 gate dieletric with n+-polysilicon gate,”Proc. of Symposium on VLSI technology, 2000 2014년 9월 2일/카테고리: Conferences /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-09-02 10:32:472014-09-02 10:33:00 "Single-layer thin HfO2 gate dieletric with n+-polysilicon gate,”Proc. of Symposium on VLSI technology, 2000
