“Reliability of thick oxides integrated with HfSiOx gate dielectric”, Ext. Abs. of SSDM, p.1122, 2006. 2014년 9월 2일/카테고리: Conferences /작성자: exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-09-02 15:49:182014-09-02 15:49:21 “Reliability of thick oxides integrated with HfSiOx gate dielectric”, Ext. Abs. of SSDM, p.1122, 2006.