https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-02 16:45:122014-09-02 16:45:15 “Reliability characterization of metal electrode/high-k dielectric stacks for 45nm node beyond ”, Proc. of IWDTF, Tokyo. Japan, 2008. (invited)