https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-02 14:02:012014-09-02 14:03:19“Relaxation of FN stress induced Vth shift in nMOSFETs with HfSiON and TiN gate,” Proc. of Device Research Conference, p.17, 2004