“Opportunities and challenges in ALD processing for advanced gate stack applications”, Proc. of ALD conference, 2006. (Invited)

/카테고리: /작성자:
다음의 항목 또한 추천합니다.
“Characterization of ultra-thin dielectric using time domain reflectometry" presented at Int. Workshop on Dielectric Thin Films. (IWDTF)…
“Interfacial defects at top gate graphene FETs investigated using a novel discharging current measurement method”, presented at…
“Highly sensitive Al2O3 passivated CVD graphene photodetectors for UV to IR region”, presented at Int. Workshop on…
“Reliability characteristics of MoS2 FETs,” Int. Conf. on Solid State Device and Materials(SSDM), 2013.
” Comprehensive Study for RF Interference Limited 3D TSV Optimization”, Proc. of VLSI-TSA , April, 2013
“Sub-10nm1T-1R Cell Design using HfOx based ReRAM Cell”, Proc. of VLSI-TSA, April, 2013.