https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-02 14:50:592014-09-02 14:51:20“Hot carrier and cold carrier studies during stress in Hf-silciate NMOS transistors with Poly and TiN gate stack,” Proc. of IRPS, p.638, 2005.