“Enhanced Reliability In Ultra-Scaled HfSiON Gate Dielectrics Through Suppressed Crystallization,” SISC, 2005. 2014년 9월 2일/카테고리: Conferences /작성자: exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-09-02 15:26:332014-09-02 15:26:36“Enhanced Reliability In Ultra-Scaled HfSiON Gate Dielectrics Through Suppressed Crystallization,” SISC, 2005.