“Effect of Barrier layer on the Electrical and Reliability Characteristics of High-k gate dielectric films,” Tech. Dig. of Int. Electron Device Meetings, p.707, 1998

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다음의 항목 또한 추천합니다.
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“ Integration of dual workfunction metal gate CMOS devices,” US patent No. 6653698, 2003.
"Apparatus and methods for wafer debonding using a liquid jet,” US patent No.5783022, 1998.