https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-02 15:28:122014-09-02 15:28:16 “Atomic Layer Deposition of High k Dielectric and Metal Gate Stacks for MOS Devices,” Characterization and Metrology for ULSI technology, 2005. (Invited)