https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-09-02 15:30:172014-09-02 15:30:20 “A study of high-k removal by plasma etching and its effect on gate dielectric characterization”, 53rd AVS Symp., 2006.