“A novel in situ plasma treatment for damage-free metal/high-k gate stack RIE proces,” IEDM, 2006. 2014년 9월 2일/카테고리: Conferences /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-09-02 16:00:582014-09-02 16:01:05 “A novel in situ plasma treatment for damage-free metal/high-k gate stack RIE proces,” IEDM, 2006.