https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 15:48:102014-08-29 15:48:13"Thickness optimization of the TiN metal gate with polysilicon-capping layer on Hf-based high-k dielectric", Microelectronic Engineering, 83, 460, 2006.