https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 14:14:132014-08-29 14:14:20“Thermal response of Ru electrodes in contact with SiO2 and Hf based high-K gate dielectrics,” J. Appl. Phys. 98, p.043520, 2005