https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 13:59:322014-08-29 13:59:35 "Probing stress effects in HfO2 gate stacks with time dependent measurements," Microelectronics and Reliability, vol. 45, No. 5-6, p. 806, 2005