https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 11:47:502014-08-29 11:47:53“Mobility improvement after HCl post-deposition cleaning of high-k dielectric, A potential issue in wet etching of dual metal gate process technology,” IEEE Elect. Dev. Lett., 26, p.163, 2005