https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 14:32:142014-08-29 14:32:37“Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process,” J. Electrochem. and Solid-State Lett. 8, G271, 2005