“Hot Carrier Degradation of HfSiON Gate Dielectrics with TiN Electrode”, IEEE Trans. Dev. Mat. Reliability, v.5, p.177, 2005. 2014년 8월 29일/카테고리: Journals /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-08-29 14:01:212014-08-29 14:01:24“Hot Carrier Degradation of HfSiON Gate Dielectrics with TiN Electrode”, IEEE Trans. Dev. Mat. Reliability, v.5, p.177, 2005.
