https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif00exelhttps://gistexel.com/wp-content/uploads/2014/08/logo_exel.gifexel2014-08-29 17:16:552014-08-29 17:17:01"Enhanced Process-Induced Strain using Metal Gate/High-k Dielectric Stack on Nano-scale CMOSFET", Solid State Technology, September, 2007.