“Electron Trap Generation in High-k Gate Stacks by Constant Voltage Stress”, IEEE Trans. Dev. Mat. Reliability, 6, p.123-131, 2006. 2014년 8월 29일/카테고리: Journals /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-08-29 16:05:232014-08-29 16:05:27 “Electron Trap Generation in High-k Gate Stacks by Constant Voltage Stress”, IEEE Trans. Dev. Mat. Reliability, 6, p.123-131, 2006.