“Effect of ALD HfO2 thickness on charge trapping and mobility”, Microelectronic Eng., 80, p.218, 2005. 2014년 8월 29일/카테고리: Journals /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-08-29 14:04:542014-08-29 14:07:32“Effect of ALD HfO2 thickness on charge trapping and mobility”, Microelectronic Eng., 80, p.218, 2005.
