“Charge trapping and detrapping characteristics in hafnium silicate gate stack under static and dynamic stress,” IEEE Elect. Dev. Lett., 26, p.197, 2005 2014년 8월 29일/카테고리: Journals /작성자: exelDownload https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif 0 0 exel https://gistexel.com/wp-content/uploads/2014/08/logo_exel.gif exel2014-08-29 11:51:592014-08-29 11:52:02“Charge trapping and detrapping characteristics in hafnium silicate gate stack under static and dynamic stress,” IEEE Elect. Dev. Lett., 26, p.197, 2005